| 摘要 |
Provided is a film formation device, whereby it becomes possible to alter the size of a base material only by replacing a magnet unit and a target material with another ones. The film formation device (1) according to the present invention is so adapted that a film can be formed on the surface of a base material (W) that is to be conveyed into the device (1) using an evaporation source (2) that faces the front surface of the base material (W), wherein the evaporation source (2) is equipped with a target material (7), a backing plate (8), a magnet unit (9), a cathode body (10) and a cooling water passage (12). The cooling water passage (12) is so adapted that cooling water can flow through a space formed between the magnet unit (9) and the backing plate (8) which are arranged away from each other. The magnet unit (9) to be arranged may be one having a short size that corresponds to the size of a narrow base material that is narrower than the base material (W), and the target material (7) to be arranged is one having a shorter size that corresponds to the width of the magnet unit (9) arranged. |
