发明名称 |
SEMICONDUCTOR DEVICE AND PROCESS OF MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To enable a single crystal layer of a metal Ge compound to be formed on a semiconductor layer having Ge as a main component and to improve interface flatness between the metal Ge compound and the semiconductor layer.SOLUTION: The semiconductor device includes a metal Ge compound layer 16 formed on a semiconductor layer 10 having Ge as a main component. Sn is contained in the vicinity of an interface between the metal Ge compound layer 16 and the semiconductor layer 10. The metal Ge compound layer 16 is epitaxially grown on a surface of the semiconductor layer 10. |
申请公布号 |
JP2014220274(A) |
申请公布日期 |
2014.11.20 |
申请号 |
JP20130096286 |
申请日期 |
2013.05.01 |
申请人 |
TOSHIBA CORP |
发明人 |
KOIKE MASAHIRO;KAMIMUTA YUICHI;TEZUKA TSUTOMU |
分类号 |
H01L21/336;H01L21/28;H01L29/78;H01L29/786 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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