发明名称 CONDUCTIVE NANOSTRUCTURE-BASED FILMS WITH IMPROVED ESD PERFORMANCE
摘要 Optical stacks containing one or more patterned transparent conductor layers may be damaged by electrostatic discharges that occur during the optical stack manufacturing process. Such damage may result in non-conductive conductors within the patterned transparent conductor layer. An electrostatic discharge protected optical stack may include a substrate layer, a first anti-static layer having a sheet resistance of from about 106 ohms per square (Ω/sq) to about 109 Ω/sq, and a patterned transparent conductor layer. Methods of testing and assessing damage to patterned transparent conductors are provided.
申请公布号 US2014340811(A1) 申请公布日期 2014.11.20
申请号 US201414260888 申请日期 2014.04.24
申请人 Cambrios Technologies Corporation 发明人 Pschenitzka Florian
分类号 H05F1/02;H05K3/06;H05K3/12;H05K3/02;H05K1/02;H05K1/09 主分类号 H05F1/02
代理机构 代理人
主权项 1. An electrostatic discharge protected optical stack comprising: a substrate layer; a first anti-static layer having a sheet resistance of from about 106 ohms per square (Ω/sq) to about 109 Ω/sq; a transparent conductor layer.
地址 Sunnyvale CA US