发明名称 |
CONDUCTIVE NANOSTRUCTURE-BASED FILMS WITH IMPROVED ESD PERFORMANCE |
摘要 |
Optical stacks containing one or more patterned transparent conductor layers may be damaged by electrostatic discharges that occur during the optical stack manufacturing process. Such damage may result in non-conductive conductors within the patterned transparent conductor layer. An electrostatic discharge protected optical stack may include a substrate layer, a first anti-static layer having a sheet resistance of from about 106 ohms per square (Ω/sq) to about 109 Ω/sq, and a patterned transparent conductor layer. Methods of testing and assessing damage to patterned transparent conductors are provided. |
申请公布号 |
US2014340811(A1) |
申请公布日期 |
2014.11.20 |
申请号 |
US201414260888 |
申请日期 |
2014.04.24 |
申请人 |
Cambrios Technologies Corporation |
发明人 |
Pschenitzka Florian |
分类号 |
H05F1/02;H05K3/06;H05K3/12;H05K3/02;H05K1/02;H05K1/09 |
主分类号 |
H05F1/02 |
代理机构 |
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代理人 |
|
主权项 |
1. An electrostatic discharge protected optical stack comprising:
a substrate layer; a first anti-static layer having a sheet resistance of from about 106 ohms per square (Ω/sq) to about 109 Ω/sq; a transparent conductor layer. |
地址 |
Sunnyvale CA US |