GAS SPRAYER AND THIN FILM DEPOSITING APPARATUS HAVING THE SAME

摘要

A thin film depositing apparatus includes a gas sprayer which is capable of forming a uniform thin film and reducing processing time. Such a gas sprayer includes an upper plate and a bottom plate. The upper plate includes a plurality of gas injection inputs. The bottom plate is coupled to the upper plate to form diffusion space therebetween, and includes a first gas spraying holes for injecting gas in the diffusion space which is injected through the plurality of first gas injection inputs. Herein, the plurality of first gas injection inputs is arranged symmetrically with respect to each other.