| 摘要 |
Provided is a plasma treatment device in which the properties of a film formed by plasma treatment can be improved. This invention has: a treatment chamber (10) for defining a sealed space (11); a plasma-forming electrode (36) provided in the sealed space; an interior conductor (21) extending from the exterior of the treatment chamber (10) toward the plasma-forming electrode (36) through an opening (13h) formed in the treatment chamber (10); exterior conductors (22, 13) surrounding the periphery of the interior conductor (21), and defining the opening (13h) and a void (23) bounded on one side by the interior conductor (21); a sealing member (60) for dividing the void (23) into an atmosphere-side space and a space communicating with the sealed space (11), the sealing member (60) being formed from an insulator and being connected to the interior conductor (21) and the exterior conductors (22, 13); and an anti-discharge insulator (100) for filling a portion of the void (23) corresponding to the space formed on the sealed-space (11) side relative to the sealing member (60). |
