发明名称 LAMINATION STRUCTURE OF ANTIMONY-BASED P-TYPE COMPOUND SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To provide a method for forming a p-type antimony-based compound semiconductor crystal which is lattice-matched to an InP substrate, in the InP substrate with high controllability.SOLUTION: A lamination structure of an antimony-based p-type compound semiconductor is a layered structure formed by successively laminating a first compound semiconductor layer and a p-type conductive GaAsSb layer to which Si is added as an impurity, on an InP substrate. A method of manufacturing the lamination structure of the antimony-based compound semiconductor includes the steps of: laminating the first compound semiconductor layer on the InP substrate; and growing a p-type conductive GaAsSb crystal to which Si is added as an impurity, on the first compound semiconductor layer by supplying TEGa, AsH, TMSb and SiH.
申请公布号 JP2014220464(A) 申请公布日期 2014.11.20
申请号 JP20130100384 申请日期 2013.05.10
申请人 NIPPON TELEGR & TELEPH CORP <NTT> 发明人 YOKOYAMA HARUKI;HOSHI TAKUYA
分类号 H01L21/205;C23C16/30 主分类号 H01L21/205
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