LITHOGRAPHIC APPARATUS, LITHOGRAPHIC METHOD, AND METHOD FOR MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a lithographic apparatus capable of aligning a beam and a substrate and overlapping layers with high accuracy.SOLUTION: The lithographic apparatus includes: an optical system to irradiate a substrate surface with a beam; a control unit that controls a position to be irradiated with the beam; and a first measuring unit and a second measuring unit to measure a position of a mark formed on the substrate. The second measuring unit is disposed at a position nearer to the optical axis of the optical system than the first measuring unit. The control unit controls a position of the beam to irradiate the substrate on the basis of a position measurement value obtained by using the first measuring unit and on the basis of position measurement values of the same mark or marks commonly having adjoining shot regions before and after irradiation of the beam, obtained by using the second measuring unit.