发明名称 SPUTTERING TARGET FOR FORMING MAGNETIC THIN FILM
摘要 <p>This sintered-body sputtering target has, as main components thereof, an Fe-Pt alloy and a non-magnetic material, and is characterized by: including at least 50 but not more than 5000 ppm by mass of an element which forms an oxide having a lower standard free energy of formation of an oxide per 1 mol of oxygen than CO (carbon monoxide); and including, as the non-magnetic material, at least one from among carbon, a carbide, and a nitride. The present invention addresses the problem of providing a sputtering target which comprises an Fe-Pt alloy and a non-magnetic material, and with which the amount of particles generated during sputtering is significantly reduced.</p>
申请公布号 WO2014185266(A1) 申请公布日期 2014.11.20
申请号 WO2014JP61947 申请日期 2014.04.30
申请人 JX NIPPON MINING & METALS CORPORATION 发明人 SATO ATSUSHI
分类号 C23C14/34;B22F3/14;C22C5/04;C22C30/00;G11B5/65;G11B5/851 主分类号 C23C14/34
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