| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask blank which can form a minute mold pattern with high pattern accuracy in manufacturing an imprint mold.SOLUTION: A mask blank 10 comprises a translucent substrate 1 and a thin film 2 formed so as to be in contact with a surface of the substrate. The thin film 2 is made of a laminated film comprising an upper layer 4 made of material containing Si or material containing Ta, and a lower layer 3 made of material containing at least one of Hf and Zr and substantially not containing oxygen. |
