| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing an imprint mold which is capable of forming a fine mold pattern with high pattern accuracy and is capable of finally removing a thin film pattern formed for etching processing on a substrate, without damaging the mold pattern. SOLUTION: The method of manufacturing an imprint mold includes: a step of using a mask blank which has, on a light-transmissive substrate 1, a thin film comprising a laminate film of a lower layer 3 made of a material containing at least one of hafnium and zirconium and an upper layer 4 made of a material suppressing oxidation of the lower layer, and forming a thin film pattern by etching processing on the thin film; a step of performing etching processing on the light-transmissive substrate 1 with the thin film pattern as a mask to form a mold pattern; and a step of removing the lower layer of the thin film by bringing the lower layer into contact with a material in a non-excited state containing a compound between fluorine and one of chlorine, bromine, iodine, and xenon after the formation of the mold pattern. COPYRIGHT: (C)2012,JPO&INPIT |
