| 摘要 |
PROBLEM TO BE SOLVED: To control the reattachment of a removed cutting oil, while improving the efficiency of removing the cutting oil from a cylindrical substrate, in degreasing cleaning of the cylindrical substrate. SOLUTION: A method for cleaning a cylindrical substrate includes the steps of: causing a chemical solution that is fed into a degreasing cleaning bath by a chemical solution feeding device to overflow from a top surface of the degreasing cleaning bath, and when immersing the cylindrical substrate into the chemical solution, the chemical solution is fed into the degreasing cleaning bath so that a flow rate of the chemical solution on the outer surface side of the cylindrical substrate is controlled faster than that on the inner surface side; pulling up the cylindrical substrate to a position higher than a solution level of the degreasing cleaning bath after a lapse of a predetermined time from the immersion of the cylindrical substrate into the degreasing cleaning bath to complete a first degreasing cleaning step; feeding the chemical solution so that the flow rate of the chemical solution in a place corresponding to the inner surface position of the cylindrical substrate is controlled faster than that in a place corresponding to the outer surface position thereof so as to discharge the oil removed from the cylindrical substrate together with the chemical solution by causing them to overflow outside the degreasing cleaning bath while the cylindrical substrate is held at the position higher than the solution level; and re-immersing the cylindrical substrate into the degreasing cleaning bath to perform a second degreasing cleaning step at least once. COPYRIGHT: (C)2012,JPO&INPIT |
