| 摘要 |
<p>A chemical vapor deposition apparatus for a flat display is disclosed. According to an embodiment of the present invention, the chemical vapor deposition apparatus for a flat display comprises: a ground strap for grounding a lower electrode which is placed inside a processing chamber where a deposition process proceeds; and a first pressurizing unit which is connected with the lower electrode and elastically pressurizes a first area so that the first area, part of the ground strap, can be in surface contact with the lower electrode.</p> |
