| 摘要 |
<p>Provided is a glass substrate for a flat panel display, said glass substrate combining productivity and reduction in thermal shrinkage coefficient and being suitable for a flat panel display using a TFT. A glass substrate on which a TFT is to be formed and which is to be used in producing a flat panel display, comprising, in molar %, 55 to 80% of SiO2, 3 to 20% of Al2O3 and 3 to 15% of B2O3, and having a (SiO2 - 1/2Al2O3) value of 70% or less, a (SiO2+2×Al2O3)/B2O3 molar ratio of more than 9.5 to 19.0, a devitrification temperature of lower than 1280°C, and a thermal shrinkage coefficient of 60ppm or less as determined after a glass specimen has been heated from ordinary temperature at a rate of 10°C/min, kept at 550°C for one hour, cooled to ordinary temperature at a rate of 10°C/min, heated again at a rate of 10°C/min, kept at 550°C for one hour, and then cooled to ordinary temperature at a rate of 10°C/min, and as represented by the formula: thermal shrinkage coefficient (ppm) = {shrinkage of the glass specimen caused by the heat treatment/length of the glass specimen before the heat treatment} × 106.</p> |
