| 摘要 |
<p>Disclosed is a photopolymerization initiator which exhibits: high compatibility with compounds which have an ethylenically unsaturated bond in a photocurable composition, and compounds which are liquid at 25? and which have an ether bond and/or an ester bond; high solubility in solvents; high sensitivity to light (especially short wavelength light having a wavelength of 450nm or below); and no contamination of polymers or devices by decomposition products generated by light exposure. The photopolymerization initiator, which has the structure outlined below, provides a photocurable composition which exhibits excellent definition, development properties, deep curing properties, and adhesion to substrates. Also disclosed are a photocurable composition containing said photopolymerization initiator, a pattern formation method using said photocurable composition, a colour filter using said photocurable composition, and an LCD device having said colour filter. Further disclosed is a low cost and simple manufacturing method for the photopolymerization initiator. (In the formula, R1-R11 represent hydrogen atoms, alkyl groups, or the like. R3 can form a ring together with R4 or R5. R4 can form a ring together with R5. Ar represents an aryl group or a heteroaryl group. W represents a single bond or an oxygen atom. Z represents a single bond, an oxygen atom, or >NR3' (R3' represents an alkyl group, or R3' joins with R3 and forms a ring with a nitrogen atom). n represents an integer from 1-10. When n is an integer from 2-10, R4 and R5 can each be the same or different.)</p> |
