发明名称 |
Exposure apparatus and device fabricating method |
摘要 |
<p>An exposure apparatus (EX) that exposes a substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus comprises a substrate stage (PST) configured to move below the projection optical system while supporting the substrate, and a liquid receiving member (102) arranged such that liquid flowed from the substrate stage flows to the liquid receiving member.</p> |
申请公布号 |
EP2804048(A1) |
申请公布日期 |
2014.11.19 |
申请号 |
EP20140163834 |
申请日期 |
2004.08.27 |
申请人 |
NIKON CORPORATION |
发明人 |
HARA, HIDEAKI;TAKAIWA, HIROAKI |
分类号 |
G03F7/20;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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