发明名称 |
POLYAMIC ACID AND POLYIMIDE |
摘要 |
<p>[Problem] To provide a resin composition for display substrates that is capable of forming a useful polyimide film having high heat resistance, a moderate coefficient of linear expansion, and moderate flexibility. [Solution] This resin composition for display substrates comprises a polyamic acid including a structural unit represented by formula (1) and a structural unit represented by formula (3), or a polyimide including a structural unit represented by formula (2) and a structural unit represented by formula (4). (In formulae (1) to (4): X1 represents a tetravalent organic group having an aromatic group and two carbonyl groups; Y1 represents a divalent aromatic group or aliphatic group; Y2 represents a divalent aromatic group having a fluorene skeleton; and n and m each represent a natural number.)</p> |
申请公布号 |
KR20140133585(A) |
申请公布日期 |
2014.11.19 |
申请号 |
KR20147026144 |
申请日期 |
2013.03.01 |
申请人 |
NISSAN CHEMICAL INDUSTRIES, LTD. |
发明人 |
TAMURA TAKAYUKI;EBARA KAZUYA |
分类号 |
C08G73/10;C08J7/04;C08L63/00;C08L79/08 |
主分类号 |
C08G73/10 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|