发明名称 POLYAMIC ACID AND POLYIMIDE
摘要 <p>[Problem] To provide a resin composition for display substrates that is capable of forming a useful polyimide film having high heat resistance, a moderate coefficient of linear expansion, and moderate flexibility. [Solution] This resin composition for display substrates comprises a polyamic acid including a structural unit represented by formula (1) and a structural unit represented by formula (3), or a polyimide including a structural unit represented by formula (2) and a structural unit represented by formula (4). (In formulae (1) to (4): X1 represents a tetravalent organic group having an aromatic group and two carbonyl groups; Y1 represents a divalent aromatic group or aliphatic group; Y2 represents a divalent aromatic group having a fluorene skeleton; and n and m each represent a natural number.)</p>
申请公布号 KR20140133585(A) 申请公布日期 2014.11.19
申请号 KR20147026144 申请日期 2013.03.01
申请人 NISSAN CHEMICAL INDUSTRIES, LTD. 发明人 TAMURA TAKAYUKI;EBARA KAZUYA
分类号 C08G73/10;C08J7/04;C08L63/00;C08L79/08 主分类号 C08G73/10
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