| 摘要 |
A method of forming an electrode structure for a capacitive touch sensor in a transparent conductive layer 7 located on a transparent non-conductive layer 15 which is located on a colour filter layer by a direct write laser scribing process uses a pulsed solid state laser 20 having, at the substrate, a wavelength in the range 257 nm to 266 nm, a pulse length in the range 50 fs to 50 ns and a top hat beam profile having a uniformity of power or energy density of less than 10%, such that grooves 21 are formed in the transparent conductive layer to electrically isolate areas on opposite sides of each groove with substantially no damage to the transparent non-conductive layer or the colour filter layer beneath the transparent conductive layer. Also disclosed is an apparatus arranged to carry out the method of the invention. |
