| 摘要 |
The invention provides a positive radiation sensitive composition, an interlayer insulation film and a forming method thereof. The positive radiation sensitive composition maintains a high-level radiation sensitivity of radiation sensitive compositions and meanwhile prevents free radicals or peroxides from being generated. In this way, the following interlayer insulation film can be formed. The interlayer insulation film comprises excellent light resistance and heat resistance and prevents the light transmittance, the heat-resistant transparency and the voltage conserving rate from decreasing. The positive radiation sensitive composition in the invention comprises a polymer (A) provided with a structural unit representing a group in formula (1) in the same or different polymer molecules and an epoxy radical structural unit, a light acid generation agent (B) and one or two more compounds (C) selected from those having a hindered phenol structure, those having a hindered amine structure, those having a phosphorous acid alkyl ester structure and those having a sulfur ether structure. |
