| 摘要 |
PURPOSE: An active ray-sensitive or radiation-sensitive resin composition and a pattern forming method using the same are provided to form a pattern in which defects related to a coating operation are suppressed. CONSTITUTION: An active ray-sensitive or radiation-sensitive region composition includes the following: A resin increases the solubility with respect to an alkaline developing solution by the action of acid. A compound generates acid by the radiation of active ray or radiation ray represented by general formula 1-1 or 1-2. A resin includes either of a fluorine atom or a silicon atom and polarity conversion group. The polarity conversion group increases the solubility by the action of the alkaline developing solution. A mixed solvent is composed of two or more solvents and includes at least one solvent selected from a group represented by general formula S1 to S4. The total concentration of the solvent is 1 to 20 weight%, with respect to the whole solvent. |
