| 摘要 |
The present invention pertains to a method for manufacturing an optical element for forming a predetermined illumination pupil luminance distribution on the basis of light from a light source, the optical element being applied to an exposure apparatus performing an exposure of a predetermined pattern on a substrate with light from the predetermined illumination pupil luminance distribution, the method comprising a first step of setting the predetermined pattern in the exposure apparatus; a second step of modulating the light from the light source by a spatial light modulator, for forming a required illumination pupil luminance distribution; a third step of effecting the exposure of the predetermined pattern set in the exposure apparatus, on the substrate, based on the light modulated by the spatial light modulator; a fourth step of measuring an exposed pattern exposed on the substrate; a fifth step of adjusting the illumination pupil luminance distribution, based on the exposed pattern measured in the fourth step; and a sixth step of manufacturing the optical element, based on information of the illumination pupil luminance distribution used in the exposure of the exposed pattern. |
