| 摘要 |
<p>The present invention relates to a substrate dryer. More particularly, the present invention relates to a substrate dryer which minimizes the contact point and contact area of a substrate and an elevating member which supports and elevates a substrate to minimize a drying error of water marks or particles remaining on the substrate after a drying process. A substrate dryer according to the present invention includes a cleaning bath which receives deionized water; a chamber which is separated from or combined with the upper part of the cleaning bath and has an injection nozzle to inject an inert gas to an inner part; an elevating member which elevates the substrate in the cleaning bath and supports the bottom part of the substrate at a first point; and at least one guide member which is formed in the inner sidewall of the chamber or the cleaning bath and guides the lateral part of the substrate when the substrate is elevated.</p> |
