发明名称 PATTERN FORMING METHOD
摘要 A pattern forming method for forming a fine pattern, said pattern forming method comprising: a first step for changing into a lyophilic nature a first pattern formation region, wherein a first pattern is to be formed, in a liquid-repellent first film having a lyophilic-lyophobic conversion function, said liquid-repellent first film being formed on a substrate, to reduce the film thickness; a second step for forming a second film having a flat surface on the first film; and a third step for drying the second film and thus forming the first pattern in the first pattern formation region.
申请公布号 KR20140133538(A) 申请公布日期 2014.11.19
申请号 KR20147024593 申请日期 2013.02.13
申请人 FUJIFILM CORPORATION 发明人 MIYAMOTO KIMIAKI
分类号 H01L21/3205;H01L21/288;H01L21/336;H01L21/768;H01L29/786 主分类号 H01L21/3205
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