ELECTROSTATIC CHUCK AND SEMICONDUCTOR MANUFACTURING DEVICE

摘要

The purpose of the present invention is to easily remove a wafer from an electrostatic chuck used by being heated. The electrostatic chuck includes a carrying stand (20) formed with ceramics containing aluminum oxide and yttrium oxide; and an electrostatic electrode (22) disposed inside the carrying stand (20), wherein the yttrium oxide content is set to be 0.5-2.0 wt%.