发明名称 |
METHOD AND APPPARATUS FOR DATABASE-ASSISTED REQUALIFICATION RETICLE INSPECTION |
摘要 |
<p>A method embodiment includes providing a reticle design data that specify a plurality of printable features that are formed on the wafer using the reticle and a plurality of nonprintable features that are not formed on the wafer using such reticle, wherein the reticle design data is usable to fabricate the reticle. A reduced design database is generated from the reticle design data and this reduced design database includes a description or map of the nonprintable features of the reticle, a description or map of a plurality of cell-to-cell regions of the reticle, and a grayscale reticle image that is rasterized from the reticle design data. The reduced design database, along with the reticle, is transferred to a fabrication facility so that the reduced design database is usable to periodically inspect the reticle in the fabrication facility.</p> |
申请公布号 |
EP2803079(A1) |
申请公布日期 |
2014.11.19 |
申请号 |
EP20120864759 |
申请日期 |
2012.10.01 |
申请人 |
KLA-TENCOR CORPORATION |
发明人 |
YIIN, LIH-HUAH;IYER, VENKATRAMAN, K;SHI, RUI-FANG |
分类号 |
H01L21/027;G03F1/36;G03F1/44 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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