| 摘要 |
The present invention relates to a system to treat a sewage pipe, using plasma. The system comprises a pit with a predetermined depth; and a sewage line discharging sewage from the pit after the sewage is supplied to the pit. The system includes: an electron generation device provided on the outside of the sewage pipe to activate air in order to generate active gas; and first, second, and third injection lines connected to the electron generation device to inject the active gas generated by the electron generation device into the lower part of the pit of the sewage line, the upper part of the pit, and the sewage line to which sewage is supplied from the pit. The electron generation device comprises a plurality of first plates for first electrodes spaced apart from each other and a second plate installed between the first plates to be spaced apart from the first plates and has a second electrode pin protruding towards the first plate contiguous with the second electrode pin. As high voltage is applied to the second electrode pin, the system to treat the sewage pipe generates the active gas including radical ions and electrons from the air supplied by glow discharge generated from a second electrode pin. |
