Lithographic apparatus, method of manufacturing an article for a lithographic apparatus and device manufacturing method

摘要

A lithographic apparatus is disclosed in which a specific coating is applied to a specific surface. The coating is made from at least 99 wt % of at least one of the following: a transition metal oxide; a poor metal oxide, sulfide or selenide; a compound with the formula ATiOn where A is an element from Group 2 of the Periodic Table; or TiO2 doped with a metal from Group 3, 5 or 7 of the Periodic Table, wherein the coating is less than or equal to 49 nm thick.

主权项

1. A lithographic apparatus comprising:
a system configured to transfer a pattern to a substrate; and a coating of a photocatalyst adhered on a surface of a component of the lithographic apparatus, the coating comprising a bi-layer having the photocatalyst as a base layer and having an overlying layer, exposed to the environment, to shield the photocatalyst from the environment, wherein the overlying layer is thicker than the base layer.