Method of manufacturing semiconductor device, method of manufacturing substrate and substrate processing apparatus

摘要

A method of manufacturing a semiconductor device by using a substrate processing apparatus comprises a reaction chamber configured to process a plurality of substrates stacked at predetermined intervals, wherein a first gas flow from a first gas supply inlet and a second gas flow from a second gas supply inlet are crossed with each other before these gas flows reach the substrates. The method of manufacturing a semiconductor device comprises: loading the plurality of substrates into the reaction chamber; supplying a silicon-containing gas and a chlorine-containing gas from the first gas supply inlet into the reaction chamber, supplying a carbon-containing gas and a reducing gas from the second gas supply inlet into the reaction chamber and supplying a dopant-containing gas into the reaction chamber from the first gas supply inlet or the second gas supply inlet; and unloading the substrates from the reaction chamber.

主权项

1. A method of manufacturing a semiconductor device by using a substrate processing apparatus comprising a reaction chamber configured to process a plurality of substrates stacked at predetermined intervals, a first gas supply nozzle having one or more first gas supply inlets in the reaction chamber and a second gas supply nozzle having one or more second gas supply inlets in the reaction chamber, wherein a first gas flow from the first gas supply inlets and a second gas flow from the second gas supply inlets are crossed with each other before these gas flows reach the substrates, the method comprising:
loading the plurality of substrates into the reaction chamber; forming a silicon carbide film containing dopant on the substrates, wherein the step of forming a silicon carbide film containing dopant on the substrates is comprised of supplying at least a silicon-containing gas and a chlorine-containing gas, or at least a gas containing silicon atoms and chlorine atoms from the first gas supply inlet into the reaction chamber, supplying at least a carbon-containing gas and a reducing gas from the second gas supply inlet into the reaction chamber and supplying a dopant-containing gas with a source gas containing the atoms for replacement by dopant, into the reaction chamber from either the first gas supply inlet or the second gas supply inlet; and unloading the substrates from the reaction chamber.