Plasma processing equipment and gas distribution apparatus thereof

摘要

A gas distribution apparatus for a plasma processing equipment is provided. The gas distribution apparatus includes a support plate (3) and a showerhead electrode (5) that are secured together parallelly to define a chamber for gas distribution. A first gas distribution plate (4) is arranged in the chamber horizontally. On an upper surface of the gas distribution plate (4), at least one circumferential gas-flow groove (41) around its axis and a plurality of radial gas-flow grooves (42) communicating with the at least one circumferential gas-flow groove (41) is arranged. A plurality of axial viahole (43) are formed in the at least one circumferential gas-flow groove (41) and the plurality of radial gas-flow grooves (42). The gas distribution apparatus can achieve a uniform gas distribution in the plasma processing equipment.

主权项

1. A gas distribution apparatus used for a plasma processing equipment, comprising a horizontally arranged support plate which is fixedly connected to a top electrode of the plasma processing equipment, a first air inlet passage is provided at a central position of the support plate; a showerhead electrode, which is parallel to the support plate, is fixedly connected below the support plate, a first gas distribution plate is horizontally arranged in a chamber between the support plate and the showerhead electrode, and the first gas distribution plate has a plurality of axial viahole; a central position of the first gas distribution plate is corresponding to the central position of the support plate;
wherein a plurality of circumferential gas-flow grooves surrounding the central position of the first gas distribution plate and a plurality of radial gas-flow grooves communicating with the plurality of circumferential gas-flow grooves, are arranged on an upper surface of the gas distribution plate; the plurality of axial viahole are arranged in a plurality of the at least one circumferential gas-flow grooves and the plurality of radial gas-flow grooves; the plurality of radial gas-flow grooves being uniformly distributed, and a width of a respective one of the plurality of radial gas-flow grooves being gradually reduced outwards along a radial direction of the first gas distribution plate; and a width of a respective one of the plurality of circumferential gas-flow grooves successively increasing outwards along the radial direction of the first gas distribution plate.