发明名称 |
Manufacturing method of roller for manufacturing patterned retarder film |
摘要 |
A method for producing a roller used for manufacturing a retarder film is provided. The method includes providing the roller having a roller surface; providing an embossing tool having an embossing end and embossing the roller surface with the embossing tool. The embossing end has a plurality of first microgroove structures and second microgroove structures. The first and second micro-groove structures are both parallel structures. Each one of the first microgroove structures is symmetric to each one of the second microgroove structures with respect to a symmetry line. An included angle of the symmetry line between each first micro-groove structure and that between each second micro-groove structure are 45±8 degrees. |
申请公布号 |
US8887396(B2) |
申请公布日期 |
2014.11.18 |
申请号 |
US201213483071 |
申请日期 |
2012.05.30 |
申请人 |
Benq Materials Corporation |
发明人 |
Wu Lung-Hai;Hong Cyun-Tai;Wu Fung-Hsu |
分类号 |
B21H1/14;B21H1/18;B21H1/22;B26D3/08;B31F1/07 |
主分类号 |
B21H1/14 |
代理机构 |
CKC & Partners Co., Ltd. |
代理人 |
CKC & Partners Co., Ltd. |
主权项 |
1. A method for making a roller used for manufacturing a retarder film, comprising:
providing the roller having a roller surface; providing an embossing tool having an embossing end; and embossing the roller surface repeatedly with the embossing tool; wherein the embossing end has a plurality of first micro-groove structures and a plurality of second micro-groove structures; the first micro-groove structures and the second micro-groove structures are structures with parallel micro-grooves; the respective first micro-groove structures are symmetric to the respective second micro-groove structures with respect to a symmetry line, one end of each of the first micro-groove structures correspondingly connects with one end of each of the second micro-groove structures at the symmetry line; and a first included angle between the symmetry line and each first micro-groove structure and a second included angle between the symmetry line and each second micro-groove structure are 45±8 degrees. |
地址 |
Taoyuan County unknown |