发明名称 Imprint system, imprint method, and non-transitory computer storage medium
摘要 The present invention is an imprint system including an imprint unit transferring a transfer pattern to a coating film formed on a substrate using a template having the transfer pattern formed on a front surface thereof to form a predetermined pattern in the coating film, the imprint system including: a substrate carry-in/out station connected to the imprint unit, capable of keeping a plurality of the substrates, and carrying the substrate into/out of the imprint unit side; and a template carry-in/out station connected to the imprint unit, capable of keeping a plurality of the templates, and carrying the template into/out of the imprint unit side at a predetermined timing.
申请公布号 US8888920(B2) 申请公布日期 2014.11.18
申请号 US201013376876 申请日期 2010.06.11
申请人 Tokyo Electron Limited 发明人 Terada Shoichi;Kimura Yoshio;Kitano Takahiro
分类号 C23C16/00;B05C5/00;B05C9/08;B05C1/06;B05B13/02;H01L21/677;B28B7/38;B29C33/58;B08B3/02;G03F7/00;B82Y10/00;H01L21/67;B82Y40/00;B05C13/00;B05D3/12 主分类号 C23C16/00
代理机构 Posz Law Group, PLC 代理人 Posz Law Group, PLC
主权项 1. An imprint system comprising an imprint unit transferring a transfer pattern to a coating film formed on a substrate using a template having the transfer pattern formed on a front surface thereof to form a predetermined pattern in the coating film, said imprint system comprising: a substrate carry-in/out station connected to said imprint unit, capable of keeping a plurality of the substrates, and carrying the substrate into/out of a side of said imprint unit-side; and a template carry-in/out station connected to said imprint unit, capable of keeping a plurality of the templates, and carrying the template into/out of the side of said imprint unit at a predetermined timing, wherein a template cleaning block cleaning a front surface of a template carried out of said imprint unit is disposed between said imprint unit and said template carry-in/out station, wherein said template cleaning block has an ultraviolet irradiation part irradiating the front surface of the template with ultraviolet light, wherein said template cleaning block has a cleaning solution supply part that is movable toward the template, and the cleaning solution supply part that is moved toward the template supplies a cleaning solution to the front surface of the template supplies a cleaning solution to the front surface of the template and said template cleaning block includes a casing enclosing both the ultraviolet irradiation part and cleaning solution supply part, wherein said imprint system includes a plurality of stations disposed in a straight line extending from the template carry-in/out station on a first end of said straight line to the substrate carry-in/out station on a second end of said straight line, wherein said template cleaning block and said imprint unit are located in said straight line between the template carry-in/out station and the substrate carry-in/out station.
地址 Tokyo JP