发明名称 Lateral power MOSFET structure and method of manufacture
摘要 A lateral power MOSFET with a low specific on-resistance is described. Stacked P-top and N-grade regions in patterns of articulated circular arcs separate the source and drain of the transistor.
申请公布号 US8890244(B2) 申请公布日期 2014.11.18
申请号 US201012775440 申请日期 2010.05.06
申请人 Macronix International Co., Ltd. 发明人 Lin Cheng-Chi;Lin Chen-Yuan;Lien Shih-Chin;Wu Shyi-Yuan
分类号 H01L29/66;H01L29/78;H01L29/06;H01L29/08;H01L29/10;H01L29/423 主分类号 H01L29/66
代理机构 Stout, Uxa & Buyan, LLP 代理人 Stout, Uxa & Buyan, LLP ;Uxa Frank J.
主权项 1. A semiconductor structure, comprising: a substrate of a P-type material; a high-voltage well disposed in the substrate of a N-type material; an element having a source area and a drain area disposed in the high-voltage well; a top region of the P-type material disposed in, and separated from the source and drain areas by, the high-voltage well; a grade region of the N-type material disposed on the top region; the structure has a circular topography disposed about a center; a first section comprises a first plurality of disjoined slices defined by a first set of circular arcs; a second section comprises a second plurality of disjoined slices defined by a second set of circular arcs; and one or more slices of the first section alternate with one or more slices of the second section; first and second P-wells having an annular shape and disposed in a surface of an outer portion of the N-well and in the substrate outside of and adjacent to the N-well, respectively; the P-top region has a shape of an annular ring and is encircled by the first P-well, and the N-grade region has an annular shape, the structure further comprising: an N-type drain having an annular shape and disposed in an annular portion of the surface of the N-well and encircled by the P-top region; a source including annular N-type and P-type respective inner and outer regions disposed in a surface of the first P-well; and a P-type bulk region having an annular shape and disposed in a portion of a surface of the second P-well.
地址 Hsinchu TW
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