发明名称 |
Lateral power MOSFET structure and method of manufacture |
摘要 |
A lateral power MOSFET with a low specific on-resistance is described. Stacked P-top and N-grade regions in patterns of articulated circular arcs separate the source and drain of the transistor. |
申请公布号 |
US8890244(B2) |
申请公布日期 |
2014.11.18 |
申请号 |
US201012775440 |
申请日期 |
2010.05.06 |
申请人 |
Macronix International Co., Ltd. |
发明人 |
Lin Cheng-Chi;Lin Chen-Yuan;Lien Shih-Chin;Wu Shyi-Yuan |
分类号 |
H01L29/66;H01L29/78;H01L29/06;H01L29/08;H01L29/10;H01L29/423 |
主分类号 |
H01L29/66 |
代理机构 |
Stout, Uxa & Buyan, LLP |
代理人 |
Stout, Uxa & Buyan, LLP ;Uxa Frank J. |
主权项 |
1. A semiconductor structure, comprising:
a substrate of a P-type material; a high-voltage well disposed in the substrate of a N-type material; an element having a source area and a drain area disposed in the high-voltage well; a top region of the P-type material disposed in, and separated from the source and drain areas by, the high-voltage well; a grade region of the N-type material disposed on the top region; the structure has a circular topography disposed about a center; a first section comprises a first plurality of disjoined slices defined by a first set of circular arcs; a second section comprises a second plurality of disjoined slices defined by a second set of circular arcs; and one or more slices of the first section alternate with one or more slices of the second section; first and second P-wells having an annular shape and disposed in a surface of an outer portion of the N-well and in the substrate outside of and adjacent to the N-well, respectively; the P-top region has a shape of an annular ring and is encircled by the first P-well, and the N-grade region has an annular shape, the structure further comprising: an N-type drain having an annular shape and disposed in an annular portion of the surface of the N-well and encircled by the P-top region; a source including annular N-type and P-type respective inner and outer regions disposed in a surface of the first P-well; and a P-type bulk region having an annular shape and disposed in a portion of a surface of the second P-well. |
地址 |
Hsinchu TW |