Radiation-sensitive resin composition and radiation-sensitive acid generating agent

摘要

A radiation-sensitive resin composition includes a compound represented by a formula (1), and a base polymer. A represents —CO— or —CH2—. R1 represents a hydrocarbon group having 1 to 30 carbon atoms, a heterocyclic group having 3 to 30 ring atoms, or a combination of a first group and a second group. The first group is —CO—, —COO—, —OCO—, —O—CO—O—, —NHCO—, —CONH—, —NH—CO—O—, —O—CO—NH—, —NH—, —S—, —SO—, —SO2—, —SO2—O— or a combination thereof, and the second group is a hydrocarbon group having 1 to 30 carbon atoms, a heterocyclic group having 3 to 30 ring atoms or a combination thereof. A part or all of hydrogen atoms included in the hydrocarbon group and the heterocyclic group are not substituted or substituted. M+ represents a monovalent cation.;

主权项

1. A radiation-sensitive resin composition comprising:
a compound represented by a formula (1); and a base polymer: wherein, in the formula (1), A represents —CO —or —CH2—; R1 represents a group represented by a formula (a1); and M+ represents a monovalent cation, wherein, in the formula (a1), R2 represents a heterocyclic group having 3 to 30 ring atoms or a cyclic ketone group having 3 to 30 ring atoms; R3 and R5 each independently represent —CO—, —COO—, —OCO—,—NHCO—,—CONH or a combination thereof; R4 represents a hydrocarbon group having 1 to 30 carbon atoms; m is an integer of 1 or 2; n is 1, wherein a part or all of hydrogen atoms included in the heterocyclic group and the cyclic ketone group represented by R2, and the hydrocarbon group represented by R4 may be unsubstituted or substituted, and wherein in a case where m is 2, a plurality of R3s are each identical or different and a plurality of R4s are each identical or different; and * denotes a binding site to —O—in the formula (1).