发明名称 |
SUPPORTING DEVICE FOR DIVIDED WINDOW PLATES OF CHAMBER FOR HEAT TREATMENT OF SUBSTRATES, AND CHAMBER FOR HEAT TREATMENT OF SUBSTRATES AND HEAT TREATMENT APPARATUS OF SUBSTRATE HAVING THE SAME |
摘要 |
<p>Disclosed are a divided window plate support device of a chamber for the heat treatment of a substrate, a chamber for the heat treatment of a substrate, and a heat treatment device for a substrate having the same. The support device for supporting divided upper and lower window plates of a chamber for the heat treatment of a substrate comprises an upper support device for supporting the upper window plate; and a lower support device for supporting the lower support device. The upper and lower support devices are extended across upper and lower housings inside the chamber for the heat treatment of a substrate in the direction, which is vertical to the loading direction of the substrate, respectively, wherein the upper and lower housings form the chamber for the heat treatment of a substrate.</p> |
申请公布号 |
KR101462460(B1) |
申请公布日期 |
2014.11.18 |
申请号 |
KR20130087687 |
申请日期 |
2013.07.24 |
申请人 |
NARAENANOTECH CORPORATION |
发明人 |
KIM, SUNG GYUN;ROH, SUNG HO |
分类号 |
H01L21/324;H01L21/02 |
主分类号 |
H01L21/324 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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