发明名称 SUPPORTING DEVICE FOR DIVIDED WINDOW PLATES OF CHAMBER FOR HEAT TREATMENT OF SUBSTRATES, AND CHAMBER FOR HEAT TREATMENT OF SUBSTRATES AND HEAT TREATMENT APPARATUS OF SUBSTRATE HAVING THE SAME
摘要 <p>Disclosed are a divided window plate support device of a chamber for the heat treatment of a substrate, a chamber for the heat treatment of a substrate, and a heat treatment device for a substrate having the same. The support device for supporting divided upper and lower window plates of a chamber for the heat treatment of a substrate comprises an upper support device for supporting the upper window plate; and a lower support device for supporting the lower support device. The upper and lower support devices are extended across upper and lower housings inside the chamber for the heat treatment of a substrate in the direction, which is vertical to the loading direction of the substrate, respectively, wherein the upper and lower housings form the chamber for the heat treatment of a substrate.</p>
申请公布号 KR101462460(B1) 申请公布日期 2014.11.18
申请号 KR20130087687 申请日期 2013.07.24
申请人 NARAENANOTECH CORPORATION 发明人 KIM, SUNG GYUN;ROH, SUNG HO
分类号 H01L21/324;H01L21/02 主分类号 H01L21/324
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