| 摘要 |
<p>A substrate processing apparatus is disclosed. The substrate processing apparatus according to one embodiment of the present invention includes: a plurality of processing chambers which perform a preset substrate process; a transfer chamber which is simultaneously connected to the processing chambers, and forms a space for transferring a substrate carrier loading a substrate between the processing chambers; a substrate input and output unit which is formed in the transfer chamber, and inputs and outputs the substrate carrier to and from the inside and the outside of the processing chambers through gate valves located between the processing chambers and the transfer chamber; and a substrate transfer unit which transfers the substrate carrier near different gate valves in the transfer chamber.</p> |
