发明名称 |
Plating bath and method |
摘要 |
Tin-silver alloy electroplating baths having certain amine-oxide surfactants and methods of electrodepositing a tin-silver-containing layer using these baths are disclosed. Such electroplating baths are useful to provide tin-silver solder deposits having reduced void formation and improved within-die uniformity. |
申请公布号 |
US8888984(B2) |
申请公布日期 |
2014.11.18 |
申请号 |
US201213370181 |
申请日期 |
2012.02.09 |
申请人 |
Rohm and Haas Electronic Materials LLC |
发明人 |
Lee Inho;Iagodkine Elissei;Qin Yi;Luo Yu |
分类号 |
C25D3/60;C25D7/12;C25D3/56;C25D3/64 |
主分类号 |
C25D3/60 |
代理机构 |
|
代理人 |
Cairns S. Matthew |
主权项 |
1. An electroplating composition comprising: a water-soluble source of divalent tin ions; a water-soluble source of silver ions; water; acid electrolyte; and an alkoxylated amine oxide surfactant having the formulawherein Ra is selected from a (C6-C22)alkyl group and a substituted (C7-C22)aryl group; Rb is an alkoxylated unit; m is 0 to 7 and represents the number of moles of Rb; n is 0 or 1; and Rc and Rd are each at least one alkoxylated unit and the total number of alkoxylated units preresent in Rc and Rd is from 3 to 30. |
地址 |
Marlborough MA US |