发明名称 Plating bath and method
摘要 Tin-silver alloy electroplating baths having certain amine-oxide surfactants and methods of electrodepositing a tin-silver-containing layer using these baths are disclosed. Such electroplating baths are useful to provide tin-silver solder deposits having reduced void formation and improved within-die uniformity.
申请公布号 US8888984(B2) 申请公布日期 2014.11.18
申请号 US201213370181 申请日期 2012.02.09
申请人 Rohm and Haas Electronic Materials LLC 发明人 Lee Inho;Iagodkine Elissei;Qin Yi;Luo Yu
分类号 C25D3/60;C25D7/12;C25D3/56;C25D3/64 主分类号 C25D3/60
代理机构 代理人 Cairns S. Matthew
主权项 1. An electroplating composition comprising: a water-soluble source of divalent tin ions; a water-soluble source of silver ions; water; acid electrolyte; and an alkoxylated amine oxide surfactant having the formulawherein Ra is selected from a (C6-C22)alkyl group and a substituted (C7-C22)aryl group; Rb is an alkoxylated unit; m is 0 to 7 and represents the number of moles of Rb; n is 0 or 1; and Rc and Rd are each at least one alkoxylated unit and the total number of alkoxylated units preresent in Rc and Rd is from 3 to 30.
地址 Marlborough MA US