Susceptor support portion and epitaxial growth apparatus including susceptor support portion

摘要

A susceptor support portion of the present invention includes a susceptor shaft and a substrate lift portion. The susceptor shaft includes a support column and a plurality of arms that extend radially from the support column, the substrate lift portion includes a support column and a plurality of arms that extend radially from the support column, the arm of the susceptor shaft includes a first arm, a second arm coupled to the first arm, and a third arm coupled to the second arm, from the support column side of the susceptor shaft, the second arm being provided with a through hole which passes through the second arm in a vertical direction, and a width of the first arm of the susceptor shaft is smaller than a width of the second arm of the susceptor shaft.

主权项

1. A susceptor support portion supporting a susceptor from below, within an epitaxial growth apparatus that forms an epitaxial film on a surface of a semiconductor wafer placed on the susceptor having a through hole, the susceptor support portion comprising:
a susceptor shaft that supports the susceptor; and a substrate lift portion that supports the semiconductor wafer, wherein the susceptor shaft includes a support column and a plurality of arms that extend radially from the support column, the substrate lift portion includes a support column and a plurality of arms that extend radially from the support column, the arm of the susceptor shaft includes a first arm, a second arm coupled to the first arm, and a third arm coupled to the second arm, from the support column side of the susceptor support portion, the second arm being provided with a through hole which passes through the second arm in a vertical direction, the arm of the substrate lift portion includes a first arm, a second arm coupled to the first arm, and a pedestal portion coupled to the second arm, from the support column side of the substrate lift portion, a lift pin capable of passing through the through hole of the susceptor shaft and the through hole of the susceptor is provided between the pedestal portion of the substrate lift portion and the semiconductor wafer, and a width of the first arm of the susceptor shaft is smaller than a width of the second arm of the susceptor shaft.