| 摘要 |
<p>The present invention relates to a crystalline silicon wafer etching method using a silicon fluoride film, an etching device thereof, a solar cell manufacturing method using the same, and a manufacturing device thereof. The present invention includes an exposure step of exposing a surface of a crystalline silicon wafer from which saw damage is removed in a dry state; an etching steam generating step of generating etching steam by converting etching solution into steam by using a microwave method; and an etching step of etching the surface of the crystalline silicon wafer by the etching steam.</p> |
