发明名称 |
Protective film mainly composed of a tetrahedral amorphous carbon film and a magnetic recording medium having the protective film |
摘要 |
A protective film is disclosed that is mainly composed of a tetrahedral amorphous carbon (ta-C film) that is denser than a DLC film formed by a plasma CVD method and containing aggregate particles so reduced as to a necessary and sufficient level, to provide a method of manufacturing such a protective film, and to provide a magnetic recording medium comprising such a protective film. The film is mainly composed of a ta-C film formed by a filtered cathodic arc method using a cathode target of glass state carbon. A magnetic recording medium is disclosed which includes a substrate, a magnetic recording layer, and the protective film mainly composed of a ta-C film. |
申请公布号 |
US8888966(B2) |
申请公布日期 |
2014.11.18 |
申请号 |
US201113323429 |
申请日期 |
2011.12.12 |
申请人 |
Fuji Electric Co., Ltd. |
发明人 |
Nagata Naruhisa |
分类号 |
C23C14/00;C23C14/32;G11B5/84;G11B5/72 |
主分类号 |
C23C14/00 |
代理机构 |
Rossi, Kimms & McDowell LLP |
代理人 |
Rossi, Kimms & McDowell LLP |
主权项 |
1. A method of manufacturing a protective film for a magnetic recording medium, the method comprising steps of:
placing a target substrate for film deposition in a film deposition chamber; generating a plasma that contains carbon ions by arc discharge between an anode and a cathode target composed of glass state carbon, wherein the glass state carbon has a structure in which fine hexagonal mesh structures of graphite are randomly combined by sp3-like bonding; transporting only carbon ions through a filter to the film deposition chamber; and forming a tetrahedral amorphous carbon film by depositing the carbon ions on the target substrate wherein the protective film has a thickness not greater than 3.0 nm. |
地址 |
JP |