| 摘要 |
PROBLEM TO BE SOLVED: To provide a light-emitting device of which variation in intensity of emitted light is small, and also to provide a method of manufacturing the same, an image formation device, and an image display device of which variation in luminance is small.SOLUTION: A light-emitting device, an image display device, and an image formation device include: a substrate 10; at least one semiconductor light-emitting element 20 provided on the substrate 10; a sidewall structure layer 40 which contains, on the substrate 10, a hole structure 42 which comprises a slope 41 formed to enclose a side surface of the semiconductor light-emitting element 20 at a position apart from the semiconductor light-emitting element 20 and is formed to have a smaller aperture on the substrate 10 side while a larger aperture on an opening 43 side, and is formed thicker than the semiconductor light-emitting element 20; and a light reflection film 50 which is provided on the slope 41 and emits light irradiated from the semiconductor light-emitting element 20 outward of the hole structure 42. |
