发明名称 METHOD FOR FORMING THROUGH-HOLE IN GLASS SUBSTRATE BY LASER BEAM IRRADIATION
摘要 PROBLEM TO BE SOLVED: To provide a method of hardly generating a conventional large narrowing part in a through-hole, when forming the though-hole in a glass substrate by laser beam irradiation.SOLUTION: The method for forming the though-hole in the glass substrate, comprises (a) a process of irradiating a laser beam to the glass substrate, thereby, the process of forming the though-hole having the narrowing part by forming the though-hole of reaching a second surface from a first surface in an irradiation area of the glass substrate and (b) a process of generating electric discharge via the though-hole by impressing DC voltage between the first surface and the second surface of the glass substrate, thereby, the process of expanding an opening dimension of a cross section in the substantially vertical direction to the drawing axis of the through-hole in the narrowing part of the through-hole.
申请公布号 JP2014213338(A) 申请公布日期 2014.11.17
申请号 JP20130091153 申请日期 2013.04.24
申请人 ASAHI GLASS CO LTD 发明人 TATSUKOSHI KENTARO;NOZU YUJI;HORIUCHI KOHEI
分类号 B23K26/382;B23K26/40 主分类号 B23K26/382
代理机构 代理人
主权项
地址