发明名称 SiC SEED CRYSTAL AND METHOD FOR MANUFACTURING SiC SINGLE CRYSTAL
摘要 PROBLEM TO BE SOLVED: To provide a SiC seed crystal capable of improving polymorphic stability during c plane growth to obtain a high quality single crystal when a SiC single crystal is grown on a c plane.SOLUTION: The SiC seed crystal comprises: a growth surface consisting of a surface approximately parallel to a c plane; and a projection part outside the maximum inscribed circle drawn inside the growth surface (when a plurality of maximum inscribed circles exist, a maximum inscribed circle existing on the downstream side of an offset direction among the maximum inscribed circles). The projection part exists on the upstream side of the offset direction and has a width smaller from the downstream side of the offset direction toward the upstream side of the offset direction. A SiC single crystal is grown on the c plane using such a SiC seed crystal.
申请公布号 JP2014214032(A) 申请公布日期 2014.11.17
申请号 JP20130090375 申请日期 2013.04.23
申请人 TOYOTA CENTRAL R&D LABS INC;DENSO CORP;SHOWA DENKO KK 发明人 GUNJISHIMA TSUKURU;TAKAHANE HIDETAKA;SHONAI TOMOHIRO
分类号 C30B29/36 主分类号 C30B29/36
代理机构 代理人
主权项
地址