ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition which causes few development defects even after long-term storage and suppresses deterioration of LWR.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition contains (A) at least two photoacid generators and (B) a resin decomposed by the action of an acid to increase in its solubility in an alkali developer. The photoacid generators include at least a photoacid generator represented by general formula (A-1) and a photoacid generator represented by general formula (A-2).