STRIPPER COMPOSITION FOR REMOVING PHOTORESIST AND STRIPPING MTHOD OF PHOTORESIST USING THE SAME

摘要

The present invention relates to a stripper composition to remove photoresist, the stripper composition exhibiting excellent photoresist removing and stripping performance and also being able to effectively suppress the generation or residue of a stain or a foreign substance on a lower layer containing copper, etc., and to a method of stripping photoresist using the same. The stripper composition to remove photoresist includes: at least one amine compound; a polar organic solvent; an alkylene glycol-based solvent; and an anticorrosive agent.