发明名称 |
NANOIMPRINT METHOD AND APPARATUS THEREFOR |
摘要 |
PROBLEM TO BE SOLVED: To provide a nanoimprint method and apparatus, capable of reducing contamination of a fine pattern transfer surface after surely forming a fine pattern of a nanometer unit on the surface of a resin film or transferring the fine pattern of a nanometer unit on the surface of the resin film and excellent in throughput when the fine pattern is transferred on the surface of the resin film.SOLUTION: A nanoimprint method comprises: a supply and transfer step of transferring an uneven pattern while supplying a sheet-like object to be transferred to a tabular stamper having an uneven pattern; a detaching and pulling step of pulling the detached object to be transferred on the supplied side while detaching the transferred object to be transferred from the stamper; and a taking-up step of taking-up the pulled object to be transferred. Each of the steps from the supply and transfer step is performed after the taking-up step. |
申请公布号 |
JP2014213552(A) |
申请公布日期 |
2014.11.17 |
申请号 |
JP20130093614 |
申请日期 |
2013.04.26 |
申请人 |
HITACHI INDUSTRIAL EQUIPMENT SYSTEMS CO LTD |
发明人 |
YUMIBA KENJI;MORI HIROHISA |
分类号 |
B29C59/02;H01L21/027 |
主分类号 |
B29C59/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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