发明名称 NANOIMPRINT METHOD AND APPARATUS THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a nanoimprint method and apparatus, capable of reducing contamination of a fine pattern transfer surface after surely forming a fine pattern of a nanometer unit on the surface of a resin film or transferring the fine pattern of a nanometer unit on the surface of the resin film and excellent in throughput when the fine pattern is transferred on the surface of the resin film.SOLUTION: A nanoimprint method comprises: a supply and transfer step of transferring an uneven pattern while supplying a sheet-like object to be transferred to a tabular stamper having an uneven pattern; a detaching and pulling step of pulling the detached object to be transferred on the supplied side while detaching the transferred object to be transferred from the stamper; and a taking-up step of taking-up the pulled object to be transferred. Each of the steps from the supply and transfer step is performed after the taking-up step.
申请公布号 JP2014213552(A) 申请公布日期 2014.11.17
申请号 JP20130093614 申请日期 2013.04.26
申请人 HITACHI INDUSTRIAL EQUIPMENT SYSTEMS CO LTD 发明人 YUMIBA KENJI;MORI HIROHISA
分类号 B29C59/02;H01L21/027 主分类号 B29C59/02
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