发明名称 |
MANUFACTURING METHOD OF REPLICA TEMPLATE, REPLICA TEMPLATE, MANUFACTURING METHOD OF WAFER USING REPLICA TEMPLATE, AND MANUFACTURING METHOD OF MASTER TEMPLATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a replica template capable of improving throughput while simplifying a pattern forming step using a replica template in a manufacturing step of a wafer, and forming a high-accuracy pattern.SOLUTION: A manufacturing method of a replica template is disclosed which is characterized in including: a master template forming step for forming a master template having a mesa structure by forming at least one cell in a cell formation region on a master substrate in accordance with an electron beam lithography method; and a pattern forming step for forming a pattern which is formed from a plurality of cells, in a pattern formation region on a replica substrate by transferring the cell which has been formed on the master template, multiple times in the pattern formation region on the replica substrate in accordance with an imprint method . |
申请公布号 |
JP2014216594(A) |
申请公布日期 |
2014.11.17 |
申请号 |
JP20130095045 |
申请日期 |
2013.04.30 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
KONO YUSUKE;KURIHARA MASAAKI |
分类号 |
H01L21/027;B29C59/02;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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