| 摘要 |
<p>PROBLEM TO BE SOLVED: To properly remove an organic matter present at a substrate surface.SOLUTION: One embodiment of a method for cleaning an ITO (Indium Tin Oxide) substrate includes: a step of introducing a process gas containing an oxygen gas, an argon gas, and a nitrogen gas; a step of generating plasma using the process gas; and a step of processing the ITO substrate using the plasma.</p> |
