| 摘要 |
<p>An etchant solution is provided to selectively etch only nickel from a material to be processed in which nickel and other metal coexist by containing a polymer acting as a metal corrosion controller excepting nickel. A nickel etchant solution comprises a polymer having at least one repeating unit selected from chemical formula I, II and III; nitric acid or sulfuric acid; hydrogen peroxide; and water. In chemical formulas, R1-R5 are hydrogen, amino group, imino group, cyano group, azo group, thiol group, sulfo group, hydroxyl group, carbonyl group, carboxyl group, nitro group, alkyl group, cycloalkyl group, aryl group or benzyl group.</p> |
