REFLECT SHUTTER AND HEAT TREATMENT APPARATUS HAVING THE SAME AND HEAT TREATMENT METHOD USING THE SAME

摘要

According to the present invention, disclosed are a reflection shutter and a thermal processing apparatus. The reflection shutter is combined to an exhaust part which is formed to be divided into at least two exhaust areas in a chamber body, and includes a top reflection shutter and a bottom reflection shutter which block the exhaust part in order to open at least one of the exhaust areas selectively. The thermal processing apparatus comprises: a chamber body comprising a thermal processing space where a unit stacking layer having a unit stacking height by stacking at least one glass substrate is stacked by at least two layers, and an exhaust part which is divided into at least two exhaust areas having an exhaust area height corresponding to at least the unit stacking height by being formed higher than a total stacking height, sum of the unit stacking height of the unit stacking layers at one side; and a reflection shutter including a main shutter which is formed to have an larger area than the exhaust part and blocks the exhaust part when the glass substrate is thermally processed and at least two unit reflection shutters which reduces thermal energy loss in the chamber by blocking the exhaust part in order for one of the exhaust areas to be opened by moving up and down, when the main shutter opens the exhaust part.