| 摘要 |
A film thickness testing method, comprising: covering a testing mask with a hollow part onto a surface of a substrate (S101); coating the substrate covered with the testing mask (S102), thereby forming a film at a place on the substrate at least corresponding to the hollow part; removing the testing mask and measuring a thickness of the film in a probe method (S103). Further provided is a film thickness testing device. The method and device can ensure the testing accuracy while reducing the costs of measurement of the film thickness. |
