发明名称 OPTICAL AIR SLIT AND METHOD FOR MANUFACTURING OPTICAL AIR SLITS
摘要 A structure having an optical slit therein. The structure includes a substrate having an opening therethrough and a metal layer disposed on the substrate, such metal layer having a photolithographically formed slit therein, such slit being narrower than the opening and being disposed over the opening, portions of the metal layer disposed adjacent the slit being suspended over the opening and other portions of the metal layer being supported by the substrate.
申请公布号 US2014335458(A1) 申请公布日期 2014.11.13
申请号 US201414444294 申请日期 2014.07.28
申请人 RAYTHEON COMPANY 发明人 Caigoy Arturo L.
分类号 G03F7/00;G03F7/20 主分类号 G03F7/00
代理机构 代理人
主权项 1. A method for forming a structure having an optical slit therein, comprising; forming an opening through a portion of a substrate; filling the opening with a sacrificial material, such material extending through a portion of the opening with portion of the material being disposed onto adjacent portions of an upper surface of the substrate; polishing the sacrificial material to remove the portions of the sacrificial material disposed onto adjacent portions of the upper surface of the substrate; forming a metalized layer on the upper surface of the substrate and the polished sacrificial material; applying a photolithographically processable material on an upper surface of the metalized layer; photolihographically forming a slit in the photolithographically processable material to expose a portion of the upper surface of the metallized layer, such slit being disposed over the opening in the portion of the substrate; etching to remove the exposed portion of the upper surface of the metaled layer to expose the sacrificial material while retaining unexposed portions of the metallized layer; removing the sacrificial layer and the photolithographically processable material.
地址 Waltham MA US